Direct laser writing system for up to 4″ x 4″ substrates. This table-top system is a versatile UV laser writer with ultra-high precision components. The user-friendly PicoMaster tools are characterized by providing the highest degree of freedom to create micro structures as small as 300nm in photosensitive layers. PicoMaster 100 key features:
- Wafer thickness 0-10 mm
- Long life 405 nm diode laser
- Automatic switching between 3 write modes: 300, 500 and 900 nm
- 4095 grayscale levels
- Area search with automatic marker recognition
- <0.3 µm top side alignment accuracy
This versatile direct laser write system is capable of processing 6″ x 6″ substrates. The equipment requires minimum cleanroom space due to its compact stand-alone design. PicoMaster 150 installation is quick and easy. PicoMaster 150 key features:
- Stand alone system with integrated vacuum pump and control PC
- Long life 405 nm diode
- Real-time laser controlled auto focus
- 4095 grayscale levels
- Automatic switching between 3 write modes: 300, 500 and 900 nm
- Area search with automatic marker recognition
- <0.3 µm top side alignment accuracy
Industrial direct laser writer for up to 8″ x 8″ substrates. The PicoMaster 200 for holographics is the most versatile system in its range and ideal for multiple purposes and large projects. The PicoMaster software presents holographic libraries and supports user libraries. Combine images and give each image a different effect, such as transparent parts, rotate, scale or order it in front or back of other images. PicoMaster 200 for holographics key features:
- Unique opportunity for security devices
- Stand alone system with integrated vacuum pump and control PC
- Can be extended (auto-loader, coating line etc.)
- Long life 405 nm diode
- Automatic switching between 3 write modes: 300, 500 and 900 nm
- Real-time laser controlled auto focus
- 4095 grayscale levels
PICOMASTER XF is an eXtra Fast maskless lithography system that pushes the throughput of your microfabrication to the next level. With new multi-beam technology, PIOCMASTER XF operates at a writing speed of 280 mm²/min with an ultimate 600 nm resolution.
With features such as:
- Parallel multi beam writing strategy
- Down to 0.6 μm resolution
- Write speed up to 280 mm²/min at 0.6 μm resolution
- 256 levels of real-time grayscale lithography
- Proprietary autofocus even on challenging substrates
- Up to 8” x 8” exposable area
- Stitch-free exposure