Raith is a leading technology manufacturer for electron beam lithography and focused ion beam nanofabrication instruments. In addition to this expertise in nanofabrication, Raith technology is employed for IC reverse engineering, IC layout reconstruction, and large area imaging in life sciences.
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ELPHY the lithography attachment enable the SEM, FIB-SEM and HIM system to provide the easiest, most convenient and low-cost solution for the nano material fabrication. The attachment significantly enlarge the bandwidth, complexity, and degree of automation of possible nanofabrication applications when adapted to the tools. ELPHY features:
Insulator deposition for growth rate studies – S. Bauerdick, Raith GmbH
Quantum effect device
CMOS decoder circuit, aligned ebeam pattern with CMOS Metal 5 vias
PIONEER Two integrates EBL and SEM imaging into a system. It is user-friendly and versatile in its nanostructure.
EBPG Plus, an ultra-high-performance electron beam lithography system with 100 kV write mode and high-resolution lithography below 5 nm. EBPG Plus offers a unique combination of automation, modularity, and performance. An intuitive user interface plus automated workflow with optional data preprocessing software helps the user to focus on achieving results instead of system handling.
Voyager is designed for fast sample turnover or small batch production by utilizing a reliable and economical workhorse. It comes with an environment-tolerant shield which ensures system stability. Voyager features:
RAITH150 Two is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications. RAITH150 Two can expose structure that are smaller than 5nm and work with sample size from a few mm up to 8-inch wafers. It allows for surface-sensitive high-resolution inspection and process control with its low kV imaging capabilities. RAITH150 Two features:
eLINE Plus supports both ultra high resolution electron beam lithography and large-area nanofabrication. It is designed for ultimate flexibility and versatility. eLINE Plus features:
5 nm lines in HSQ resist
3D nanosculpturing by electron beam induced deposition (EBID)
Nanoprobing of freely suspended Pt-nanowire, deposited on gold contact pads with EBID
Velion unique nanoFIB Two ion column delivers high resolution, excellent placement accuracy, long-term stability and record low beam tails. It is used for the stable delivery of gold, silicon, germanium, or other ions with nanometer beam diameters, the flow optimized alloy ion source and low aberration ion optics enable easy switching between multiple ion species from a single source, while preserving the high resolution and stability of the nanoFIB Two column. It is established as a standard technique for fabricating three-dimensional and high-resolution nanostructures. Velion features:
1 mm long micro-fluidic mixer channel
Advanced prototyping for a truly functional X-ray zone plate
Large plasmonic array of small features created by direct FIB milling in gold
Reverse engineering for device obsolescence ; IP protection; anti-counterfeit
Reverse engineering for bioimaging of tissues and organs to sub-cellular resolution
CHIPSCANNER helps to deliver homogenous large-area image mosaics for each layer with minimum stitching errors and stable brightness/contrast values and CAD shape extraction. It produces the most accurate and high resolution directly acquired by an SEM instrument. The CHIPSCANNER features: