Semiconductor Wafers
Wafer Deposition Service
Photomask Blank
Photomask Fabrication
Semiconductor Wafers:
- Silicon Wafers (Prime, Test or Mechanical Grade)
- Silicon On Insulator (SOI) Wafer
- Silicon Carbide (SiC) Wafer
- Indium Phosphide (InP) Wafer
- Gallium Arsenide (GaAs) Wafer
- Germanium (Ge) Wafer
- Glass Wafer
- Quartz Wafer
- Sapphire Wafer
- Solar Wafer
- Particle Control Wafer
Wafer Deposition Service: High-Quality Coatings for Semiconductor Wafers
- SiQ2, CVD: P-SiO2, P-SiON, LP-TEOS, P-TEOS, P-SiN, HDP, O3-TEOS, BPSG + Annealing
- SiO2, Thermal Oxide: Wet Oxide, Dry Oxide, RTO, Radical Oxide
- Metal Film: W, Al, Cu, Al-Cu, Ti, TiN, TaN
- Silicon Nitride: LP-HCD SiN, LP-DCS SiN, P-SiN
- EPI: Silicon-Epi, SiC-Epi, GaAs-Epi, GaN-Epi, Nitride-Epi
- Photoresist: Krf
Photomask Blanks
- 4 ~ 14” Photomask Blanks
- Substrate Materials: Soda Lime, Quartz, etc.
- Various Photoresists Coating AZ1518, AZ TFP650, etc.
Photomask & Reticle Fabrication
- Photomask for microelectronics, optical components, MEMS, MOEMS, Thin Film or Hybrid applications
- Electroplating Mold: Masking Patterns with Various Photoresist Thicknesses
- Nanoimprint Mold:
- For contact lens printing
- For Micro Lens Array (MLA) production
- For BGA package printing