M Tek/Semitool Spin Rinser Dryer (SRD)
- Cleaning, rinsing and drying of semiconductor wafers or photomasks after wet process or for effective chemical residue removal
- Capable of process up to 8″ High Profile or 12″ Low Profile wafer/cassette
- Available in Benchtop, Single Stack and Double Stack models:
- S Model SRD: 8300S/880S/870S/470S/280S/270S
- ST Mode SRD: ST-4300S/ST-2300/ST-470
- F Model: 2300-F/870-F/470-F/270-F
- Features: Brushes Motor, Non-Contact Labyrinth, Seal, Quick Disconnect Rotor, Electro polished Bowl Finish, High Uniform Spray Nozzle, and Ultra-pure teflon valve for optimum particle performance